Computational Lithography
Hsu-Ting Huang manager台積電TSMC R&D 下午 3:30–5:00 鴻經館 107 室Abstract:
As semiconductor devices had entered in the era of deep nanometer, what
designed on the circuit layout was no longer what printed on the wafer. Design for manufacturability (DFM) started to catch the attention of the industry almost two decades ago. Computational lithography is a key area in DFM. General concepts and fundamental theories of computational lithography will be introduced. A glimpse of why this field is considered math intensive will be presented.