Mathematic solutions in semiconductor industry.
蘇哿穎博士台積電 下午 3:00–3:50 鴻經館 107 室1. Design flow introduction:
1.1 Parasitic RC extraction for post-layout simulation.
1.2 Design and process information for Maxwell's equations (RC extraction).
2. Static analysis: (commerical RC extraction tool)
2.1 Poisson equation,
2.2 Numerical solution: method of moment,
2.3 Equivalent capacitance model.
3. Full-wave analysis: (commerical ElectroMagnetic field solver)
3.1 Maxwell's equations,
3.2 Numerical solution: spectral domain approach and Non-Uniform FFT,
3.3 2D and 3D applications.
4. Challenge in the 20nm technology
4.1 Double patterning technology (Graphic theory: 2-colorable).
4.2 Commercial electronic design automation (EDA) RC extraction tool: limitation and solution.